The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 12, 1989

Filed:

Jan. 27, 1987
Applicant:
Inventors:

Yoshichi Hagiwara, Sagamihara, JP;

Naoya Kimura, Sagamihara, JP;

Kenji Emori, Sagamihara, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ;
U.S. Cl.
CPC ...
430323 ; 430329 ; 430395 ;
Abstract

The present invention provides a method for forming a metal image in which a resist film is provided at an image portion and then etching processing is performed to thereby form the metal image comprising the steps of: (1) forming an image comprised of concave surface portions on a metal surface; (2) forming a resist film on the metal surface; and (3) exposing the resist film to such an extent that at the concave portions of the resist film is not made wholly soluble.


Find Patent Forward Citations

Hagiwara, Yoshichi. (1989). Process for formation of metallic relief (U.S. Patent No. 4865954). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4865954

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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