The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 1989
Filed:
Mar. 16, 1987
Applicant:
Inventors:
Shun-ichi Fukuyama, Atsugi, JP;
Yasuhiro Yoneda, Machida, JP;
Masashi Miyagawa, Isehara, JP;
Kota Nishii, Isehara, JP;
Assignee:
Fujitsu Limited, Kawasaki, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ; C08G / ;
U.S. Cl.
CPC ...
430286 ; 430270 ; 430325 ; 430296 ; 430312 ; 430313 ; 430327 ; 430271 ; 430287 ; 156643 ; 528 10 ;
Abstract
A high-energy radiation-sensitive pattern-forming resist material consisting of polysilsesquioxane having no hydroxyl group in its molecule. The pattern-forming material of this invention has an improved sensitivity to high-energy radiation exposure, a high resistance to dry etching, a high resolution capability, and an improved thermal stability.
Quick Actions:
Fukuyama, Shun-ichi. (1989). Pattern-forming material and its production and use (U.S. Patent No. 4863833). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4863833
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile