The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 05, 1989

Filed:

Jul. 08, 1988
Applicant:
Inventors:

Kenji Takeda, Tokyo, JP;

Ken Ishikawa, Tokyo, JP;

Tatsuo Kanetake, Tokyo, JP;

Takashi Kojima, Ibaraki, JP;

Akira Itsubo, Ibaraki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; B05D / ; B05D / ;
U.S. Cl.
CPC ...
427355 ; 427 44 ; 4273855 ;
Abstract

A process for producing a polydiacetylene molecular orientated film is disclosed, which comprises a first step of forming a polydiacetylene film on a base using a diacetylene monomer or a polydiacetylene, a second step of unidirectionally rubbing the polydiacetylene film with a cloth at least once, a third step of building up a diacetylene monomer on the film, and a fourth step of polymerizing the diacetylene monomer film formed in the third step in a solid phase, said second to fourth steps being carried out once or more in this order. The resulting orientated film exhibits high orientation and crystallinity without limitations in film thickness, film area, and polymer materials.


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