The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 1989
Filed:
Jun. 02, 1987
Applicant:
Inventor:
Osami Okada, Chofu, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21B / ;
U.S. Cl.
CPC ...
376143 ; 376142 ;
Abstract
A plasma confinement system comprising a toroidal vacuum chamber, a toroidal coil which generates a magnetic field in a toroidal direction within the vacuum chamber, current transformer coils which are wound in the toroidal direction, equilibrium magnetic field coils which are wound in the toroidal direction in order to control a plasma, alternating current coils which are wound mainly in the toroidal direction and through which alternating currents are caused to flow for enabling forming and rotating of a deformed magnetic surface and for causing rotation of the plasma in a poloidal direction, and power sources which cause currents to flow through the various coils.