The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 1989
Filed:
Mar. 18, 1988
Won-Sik Lee, Seoul, KR;
SamSung Electronics Co., Ltd., Suweon, KR;
Abstract
An improved test pattern for monitoring variations of critical dimensions of patterns produced during the fabrication of semiconductor devices is disclosed. The test pattern which allows the critical dimensions to be easily monitored by a microscope, has a reference pattern including a reference line corresponding to one vertical edge of the reference pattern, said reference pattern formed flatly in a given layer below the present layer, a step shaped first pattern including a plurality of vertical indication step line segments corresponding to each vertical edge of the step and being formed flatly in the present layer, each extending line of said line segments being spaced by an equal horizontal interval and one of said line segments lying in the reference line, and a step shaped second pattern including a plurality of vertical indication step line segments corresponding to vertical edges of the step of the second pattern and being formed in separation from the first pattern in the present layer, each of said line segments of the second pattern being arranged on the extending line of each line segment of the first pattern.