The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 22, 1989

Filed:

Dec. 23, 1987
Applicant:
Inventors:

Thomas N Jackson, Peekskill, NY (US);

Alan W Kleinsasser, Putnam Valley, NY (US);

Jerry M Woodall, Bedford Hills, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
357 16 ; 357-4 ; 357-5 ; 357 15 ; 357 22 ;
Abstract

A low band gap semiconductor heterostructure having a surface adaptable to planar processing and all semiconductor properties supported by a fabrication constraint relaxing substrate that does not provide a low impedance parallel current path. A superconductor normal superconductor device of n-InAs-100 nanometers thick with niobium superconductor electrodes spaced 250 nanometers apart and a 100 nanometer gate in the space. The N-InAs is supported by an undoped GaAs layer on a semi-insulating GaAs substrate. A heterojunction field effect transistor device having a GaAlAs gate over a channel 100 nanometers thick on an undoped GaAs layer on a semi-insulating GaAs substrate.


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