The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 1989
Filed:
Jun. 26, 1987
Nicholas J Phillips, Loughborough, GB;
Holtronic Technologies Limited, London, GB;
Abstract
A method of manufacturing integrated circuits using holographic techniques by interference between an input beam and a reference beam generated from laser sources. A holographic image of the object formed on a mask window, is formed on recording emulsion coated on a glass slab by means of interference between the input beam which has passed through the mask and the reference beam which is reflected from the surface of a prism in contact with the glass slab. In order to reproduce the holographic image on a silicon slice which replaces the mask, the reference beam is replayed in the reverse direction through the prism such that the interference between the input beam and the replayed reference beam causes the holographic image to be created as a real image in the silicon slice.