The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 1989

Filed:

Nov. 14, 1988
Applicant:
Inventors:

Marcel Toulemonde, Caen, FR;

Emmanuel Balanzat, Caen, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01L / ;
U.S. Cl.
CPC ...
21050040 ; 264 22 ;
Abstract

A first irradiation takes place with particles having an inadequate energy to traverse the membrane (5), followed by a second irradiation from the other face (26) of the membrane (5) using also non-issuing particles and whose trajectories come into contact with those of the other particles. Chemical etching produces pores (respectively 33, 34), whereof some issue into other pores produced during the other irradiation. As the finest pore determines the filtering properties, the selectivity of this membrane is very good.


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