The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 1989
Filed:
Apr. 07, 1988
Applicant:
Inventors:
Akira Yanagisawa, Ome, JP;
Kazumitsu Nakamura, Katsuta, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
2504911 ; 2504922 ; 356401 ;
Abstract
The invention relates to an electron beam drawing method by a matching mark detecting method for use in manufacturing of semiconductor devices. First, the surface of a semiconductor wafer is divided into a number of blocks. Each block is divided into a number of chips. Four matching marks are formed at four corners of the block. Next, the matching marks are detected by an electron beam. When the electron beam deflecting system is corrected on the basis of the position information of the detected matching marks, different correcting equations are used in correspondence to the number of matching marks detected.