The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 01, 1989

Filed:

Oct. 14, 1987
Applicant:
Inventors:

Noritaka Hamma, Sakai, JP;

Yoshikazu Saito, Nishinomiya, JP;

Toshio Nishizawa, Suita, JP;

Takashi Katsumata, Toyonaka, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61K / ; C07J / ;
U.S. Cl.
CPC ...
514167 ; 2603972 ;
Abstract

There are disclosed novel derivatives of 26,26,26,27,27,27-hexafluorovitamin D.sub.3 having fluorine atom at the 23- and/or 24-position which have an excellent pharmacological activity and a process for production thereof. The novel compounds are represented by the general formula: ##STR1## wherein R.sub.1 ' denotes a hydrogen atom, a hydroxyl group or a protected hydroxyl group, R.sub.2 denotes a hydrogen atom or a protecting group for hydroxyl group, R.sub.3 denotes a hydrogen atom, a fluorine atom, a hydroxyl group or a protected hydroxyl group and R.sub.4 and R.sub.4 ' each denotes a hydrogen atom, or one of them denotes a hydrogen atom and the other denotes a fluorine atom, hydroxyl group or a protected hydroxyl group or R.sub.4 and R.sub.4 ' are combined to denote an oxo group, with a proviso that at least one of R.sub.3, R.sub.4 and R.sub.4 ' denote a fluorine atom. The process for production thereof comprises subjecting to thermal isomerization a compound represented by the general formula: ##STR2## wherein R.sub.1 ', R.sub.2, R.sub.3, R.sub.4 and R.sub.4 ' are the same as defined above, to thermal isomerization and optionally further to deprotection reaction.


Find Patent Forward Citations

Loading…