The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 25, 1989
Filed:
Dec. 09, 1987
Applicant:
Inventors:
Assignee:
Sharp Kabushiki Kaisha, Osaka, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D / ; B05D / ; C23C / ;
U.S. Cl.
CPC ...
427 39 ; 427 74 ; 118730 ;
Abstract
An apparatus for manufacturing photosensitive amorphous silicon objects comprises a pair of coaxial cylindrical electrodes inside a reaction tank of a plasma CVD device. A plurality of cylindrical substrates of an electrically conductive material disposed between these electrodes. A source gas is injected into the reaction tank through a plurality of inlets evenly spaced on the outer peripheral wall so that films of uniform quality can be produced efficiently.