The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 25, 1989

Filed:

Mar. 20, 1987
Applicant:
Inventor:

Martin R Skov, Kr. Reutlingen, DE;

Assignee:

Metric Products, Inc., Culver City, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A62B / ;
U.S. Cl.
CPC ...
12820616 ; 12820619 ;
Abstract

A face mask to be worn upon the face of a wearer and for providing filtering of particular impurities in the air, including at least one layer of flexible plastic material molded generally to conform to the contours of the face of the wearer and forming a flexible support carrier for filter material and with the one layer formed of openwork flexible plastic material for providing a plurality of perforations through the first layer for allowing the free passage of air through the one layer, and a separate layer of filter material supported by the one layer of flexible plastic material and with the filter material filtering out the particular impurities in the air.


Find Patent Forward Citations

Skov, Martin. (1989). Face mask (U.S. Patent No. 4850347). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4850347

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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