The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 18, 1989

Filed:

Mar. 02, 1988
Applicant:
Inventor:

Hisayuki Shimizu, Yokohama, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F / ; G21K / ;
U.S. Cl.
CPC ...
364468 ; 2504911 ; 2504922 ; 356400 ; 364490 ; 364559 ;
Abstract

An exposure apparatus has a moving member which can two-dimensionally move a photosensitive substrate in a direction of a reference plane, which is substantially parallel to or coincides with a predetermined image surface on which an original image is to be formed. Information associated with a distance between the surface of the photosensitive substrate and the reference plane is sequentially detected for each of a plurality of regions on the photosensitive substrate to be exposed, and a flatness of the surface of an exposed region of interest with respect to the predetermined image surface is then detected in accordance with information associated with a distance of the exposed region of interest and information associated with the distances of a plurality of exposed regions surrounding the exposed region of interest among a plurality of detected distance data.


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