The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 1989
Filed:
Dec. 16, 1987
Applicant:
Inventors:
Peter D Scovell, Chelmsford, GB;
Peter F Blomley, Bishops Stortford, GB;
Roger L Baker, Chelmsford, GB;
Assignee:
STC PLC, London, GB;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437 31 ; 437 33 ; 437228 ; 437233 ; 148D / ; 357 34 ; 357 59 ; 156653 ;
Abstract
A method of manufacturing a bipolar transistor (1) with semi-self-aligned p.sup.+ base contacts (27,27a). A p-type base region (28) is formed in a surface region of an n-type region 5 comprising a collector. An element (29) of, for example, n.sup.+ doped polycrystalline silicon, and comprising an emitter, is formed on the surface in contact with the base region (28). The base contacts (27,27a) are formed by implantation and using the element (29) as a mask. An n.sup.+ collector contact (25) is made to the n-tpe region (5).