The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 18, 1989

Filed:

Jan. 27, 1988
Applicant:
Inventors:

Richard H Dee, Louisville, CO (US);

Laurence L Rea, Denver, CO (US);

Darwin D King, Loveland, CO (US);

Guy F Ruse, Boulder, CO (US);

Assignee:

Storage Technology Corporation, Louisville, CO (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427 48 ; 118 50 ; 118500 ; 118722 ; 118730 ; 2041922 ; 427128 ; 4272555 ; 427294 ; 428694 ; 428900 ;
Abstract

A method and apparatus is disclosed for permitting a plurality of substrates to be positioned within a magnetic field unique to each substrate so that the plurality of substrates may be placed in a vacuum chamber and concurrently coated with a thin film. A magnetic field unique to and associated with each substrate may be oriented so that all substrates have a uniform magnetic field and magnetic orientation. Alternatively, the magnetic field and orientation of each substrate may be individually tailored to produce a different magnetic characteristic for each substrates.


Find Patent Forward Citations

Loading…