The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 18, 1989

Filed:

May. 18, 1987
Applicant:
Inventors:

Volker Doorman, Hamburg, DE;

Jens-Peter Krumme, Hamburg, DE;

Assignee:

U.S. Philips Corporation, New York, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; C23C / ; C23C / ;
U.S. Cl.
CPC ...
20419215 ; 2041923 ; 20419226 ;
Abstract

A method is disclosed of manufacturing an optical stripline waveguide for use in non-reciprocal optical components, in which a monocrystalline waveguide strip having a refractive index n.sub.2, which is surrounded by material with a lower refractive index n.sub.1, is provided on a monocrystalline substrate, the waveguide strip and the material surrounding it being deposited on a substrate by means of RF cathode sputtering (sputter epitaxy) in an inert gas plasma, making use of a target which contains mainly iron garnet phase, together with other phases with an almost equal sputtering rate, the crystal lattice of said substrate being locally disturbed in the surface regions where no waveguide strip is to be grown, thereby forming a lattice disorder.


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