The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 1989
Filed:
Sep. 20, 1984
Andre Ezis, Grosse Ile, MI (US);
Elaine C Beckwith, Riverview, MI (US);
Ceradyne, Inc., Costa Mesa, CA (US);
Abstract
A method of making a reaction bonded/hot pressed silicon nitride comprising object is disclosed. Second phase crystallites are formed prior to hot pressing. A mixture of silicon, SiO.sub.2, and 0.4-2.3 molar percent (by weight of the silicon) of oxygen carrying agents, i.e., Y.sub.2 O.sub.3 and Al.sub.2 O.sub.3, is performed and reaction nitrided to form discs or billets having at least 60% alpha Si.sub.3 N.sub.4 and a high proportion of second phase crystallites which displace substantially all silicate glass except for a controlled small quantity. The reactive amounts of Y.sub.2 O.sub.3, Al.sub.2 O.sub.3 and SiO.sub.2 are controlled to assure formation of substantially Y.sub.1 SiO.sub.2 N as the second phase crystallite. Al.sub.2 O.sub.3 is controlled in an amount of 0.4-4% by weight to ensure that the small proportion of glass serves to protect the oxynitrides against linear oxidation kinetics. The hot pressed material has no visual mottle porosity associated therewith.