The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 1989
Filed:
Jul. 20, 1987
Joseph A Bossier, III, Greenwell Springs, LA (US);
Douglas M Richards, Houston, TX (US);
Lloyd T Crasto, Humble, TX (US);
Ethyl Corporation, Richmond, VA (US);
Abstract
A continuous method for preparing silane and a co-product by reacting a metal hydride such as NaAlH.sub.4 with a silicon halide such as SiF.sub.4. The method involves a reactor loop comprising a primary reactor, a secondary reactor and a separation zone. Most of the metal hydride is reacted in the first reactor to which it is added in a substantially constant rate. The remainder of the hydride is reacted in the secondary reactor, in which all or substantially all of the silicon halide is added. The rate of silicon halide addition is governed by feed back from the reaction in the secondary reactor, (.rarw.T so that stoichiometric or substantially stoichiometric operation is achieved. This conserves resources, provides improved co-product and reduces costs.