The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 1989
Filed:
Feb. 09, 1987
Applicant:
Inventor:
Orest Engelbrecht, Ridgefield, CT (US);
Assignee:
The Perkin-Elmer Corporation, Norwalk, CT (US);
Primary Examiner:
Int. Cl.
CPC ...
B65G / ;
U.S. Cl.
CPC ...
414754 ; 414752 ; 414737 ; 414757 ; 414225 ; 414416 ; 414331 ; 4147441 ; 901 47 ; 901 27 ;
Abstract
Apparatus is set forth for prealigning the transport stage of an automated wafer handling lithographic system. The wafer is first rotated and its displacement in X, Y, and .THETA. from a desired orientation is determined. Rotation of the wafer is stopped when its angular position reaches a desired orientation. The wafer chuck of the transport stage is then displaced to compensate for any deviation of the wafer in the X and Y directions from a desired rectilinear orientation. This permits the wafer stage to present the wafer to the exposure station of a lithographic system aligned in the X, Y and .theta. directions.