The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 11, 1989

Filed:

Jun. 21, 1988
Applicant:
Inventors:

Marion J Soileau, Jr, Orlando, FL (US);

Eric W Van Stryland, Orlando, FL (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B / ; G02F / ; G02F / ;
U.S. Cl.
CPC ...
350354 ; 350363 ; 350381 ; 350390 ;
Abstract

Collimated incident optical radiation which might contain high-intensity or igh-power radiation is focused into the body of a limiter by a first lens formed at one end of the limiter. The body is a cylinder of revolution with an axis along the optical axis between radiation and a sensitive detector. Radiation of normal intensity or power freely passes through the body and is recollimated by a second lens formed at the other end of the limiter from the first lens. The body is made of material which is subject to two-photon absorption such that high-intensity or high-power radiation undergoes absorption and is consequently self-defocused such that it is diverted from the optical path. For visible light, the material may be ZeSe or ZnS; for ultraviolet, copper chloride; for infrared, HgCgTe.


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Soileau, Jr, Marion. (1989). Monolithic optical power limiter based on two-photon absorption (U.S. Patent No. 4846561). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4846561

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