The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 1989
Filed:
Feb. 09, 1988
Wilfrid B Veldkamp, Lexington, MA (US);
Gary J Swanson, Lexington, MA (US);
Abstract
The high diffraction efficiency regime of binary gratings occurs at periodicities on the order of a wavelength in order to produce grating which diffract radiation with efficiencies of greater than 90%, a fabrication procedure is disclosed which uses halographic and very large scale integration techniques which allow fine control over the periodicity and depth parameters to produce binary planar optical elements having a ratio of .lambda./T greater than one (where .lambda. equals the wavelength of an illuminating wavefront, and T equals the grating periodicity). Additionally, the disclosed process produces high optical quality diffractive elements with phase precision of as high as .lambda./100. These diffractive elements include laser beam multiplexers, beam profile shapers, and binary lenses which are lossless optical transfer functions.