The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 1989
Filed:
Dec. 08, 1987
Applicant:
Inventor:
Naohiro Matsukawa, Kamakura, JP;
Assignee:
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03B / ;
U.S. Cl.
CPC ...
355 53 ;
Abstract
In a reduced projection type step- and repeat-exposure apparatus of the present invention, the angle of inclination of an exposure area on the wafer is first detected, and then corrected on the basis of the detected value. This measurement corrects the inclination of the exposure area. Hence, high precision patterning can be realized, even if an optical system having a small focus margin is used.