The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 04, 1989

Filed:

Nov. 12, 1987
Applicant:
Inventor:

Egbert deVries, Kettering, OH (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D / ; C01B / ; C01B / ; C01B / ;
U.S. Cl.
CPC ...
423210 ; 423224 ; 423235 ; 423236 ; 423242 ; 423240 ; 4232451 ; 422168 ;
Abstract

A control system is provided for a mist scrubbing process in which a gas containing odorous and acidic contaminants is cocurrently contacted in a reaction chamber with tiny droplets of an aqueous reagent to react with and destroy the contaminants. The reagent contains an oxidizing agent and a base and the process is controlled by measuring a property, typically pH, of spent spray liquid settling at the bottom of the chamber. That measurement is used to meter the flow rate of base into the system while at the same time the concentration of an acidic contaminant in the scrubbed gas stream leaving the reaction chamber is measured and that measurement is used to meter the injection rate of an oxidizing agent into the system.


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