The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 1989
Filed:
Dec. 01, 1987
Applicant:
Inventors:
Nobuhiro Kawatsuki, Kurashiki, JP;
Katsuya Fujisawa, Kurashiki, JP;
Ichiro Matsuzaki, Kurashiki, JP;
Masao Uetsuki, Kurashiki, JP;
Assignee:
Kuraray Company, Ltd., Kurashiki, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430-5 ; 430-1 ; 430321 ; 430323 ; 35016222 ;
Abstract
The present invention provides a process for producing a blazed diffraction grating by using a transmission modulation diffraction grating as a photomask in photolithography. The photomask is composed of a relief modulation diffraction grating (A) made of a transparent material and a blazed diffraction grating (B) made of a material containing a ray absorbing agent. The diffraction grating (A) and the diffraction grating (B) are mated with each other through their grating surfaces.