The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 1989
Filed:
May. 13, 1988
Shoji Noro, Iruma, JP;
Shigemi Mukaiyama, Suzuka, JP;
Asahi Kasei Kogyo Kabushiki Kaisha, Osaka, JP;
Abstract
The present invention relates to a polishing cloth comprising an expanded thermoplastic resin product having a cellular structure, and an expansion ratio of 1.5-fold to 30-fold, with substantially uniform cells having an average cell diameter of 300 .mu.m or less being distributed within the cross-section of the expanded product, and with unexpanded resin phases of 0.5 .mu.m to 45 .mu.m surrounded by three or more cells, wherein the proportion of the unexpanded phases are 0.01% to 70% in terms of area ratio within the expanded product cross-section, which has excellent performance of mirror surface polishing, for example, integrated circuit substrate, disc substrate for information recording, optical lens, optical mirror, etc. The present invention particularly relates to a polishing cloth for precise polishing to a surface roughness of 100 .ANG. or less.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile