The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 1989
Filed:
Oct. 02, 1987
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
In a process for development, fixing, and washing or stabilization of a silver halide photographic light-sensitive material by means of an automatic developing machine, is provided, which process comprises supplying to a developing bath and/or a fixing bath a concentrated developing solution and/or a concentrated solution having a fixing capacity, respectively, and water which has been treated by at least one antifungal means selected from the group consisting of irradiation with ultraviolet rays, irradiation with magnetic fields, processing with ion exchange resins, and incorporation of at least one compound selected from the group consisting of aminopolycarboxylic acids and phosphonic acids. In a preferred embodiment, the amount of wash water or stabilizing sollution to be refilled is 3 l or less (including 0 l) per 1 m.sup.2 of light-sensitive material, and the water processed by antifungal means contained in the stock tank is also used as the wash water or stabilizing solution.