The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 1989
Filed:
Jun. 06, 1988
Applicant:
Inventors:
Peter Gulde, Berlin, DE;
Christian Scholz, Stockdorf, DE;
Assignee:
Siemens Aktiengesellschaft, Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; C03C / ; C23F / ;
U.S. Cl.
CPC ...
156643 ; 156646 ; 156652 ; 156656 ; 1566591 ; 156904 ; 20419234 ; 20419235 ;
Abstract
A copper and/or permalloy layer is structured by means of dry etching. A layer of tantalum is applied as a mask to a layer to be structured, and a photoresist layer is applied to the tantalum layer. Subsequently, the structure of the photoresist layer generated in a photolithographic manner is transferred onto the mask by reactive ion etching. This procedure is continued until the copper or permalloy layer to be structured is exposed. The structuring of the copper or permalloy layer then occurs by ion beam etching.