The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 1989
Filed:
Sep. 18, 1987
Applicant:
Inventors:
Masami Nishida, Kyoto, JP;
Nobutoshi Orgami, Shiga, JP;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23F / ;
U.S. Cl.
CPC ...
156345 ; 118 52 ; 118 50 ; 118 64 ; 118320 ; 134140 ; 134157 ;
Abstract
An improved processing apparatus for a substrate surface, which provides uniform and smooth air flows A within the processing chamber 26, by which an even thin film of a processing solution can be formed on the substrate surface. Undersirable surplus processing solution is collected primarily in a first chamber 13. A second chamber 15 is provided which is separate from the first chamber and pneumatically communicated therewith through a slit 16.
Nishida, Masami. (1989). Apparatus for processing substrate surface (U.S. Patent No. 4838979). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4838979
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile