The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 1989
Filed:
May. 31, 1988
John A Dunlop, Veradale, WA (US);
Hans Rensing, Rossland, CA;
Cominco Ltd., Vancouver, CA;
Abstract
Tungsten-titanium sputtering targets with improved characteristics are made from high-purity tungsten powder and a second powder consisting of high-purity titanium hydride powder or high-purity titanium hydride powder and high-purity titanium powder. The second powder contains at least 5%, preferably 25% to 100% by weight of titanium hydride powder. A powder mixture having a binodal particle size distribution with respect to the tungsten and second powders is placed under a containment pressure in a die. The die is heated in a vacuum hot-press chamber to a temperature sufficient to dehydride the titanium hydride, and to remove gases and alkali metals. The die is then heated to a second temperature in the range of 1350.degree. to 1550.degree. C. while maintaining the containment pressure and vacuum. A compaction force in the range of 2000 to 5000 psi is then applied to form a compact. The compaction force and vacuum are subsequently released and the compact is cooled. The compact is easily machined to give a sputtering target having a density of at least 95%, preferably, at least 100% of theoretical density, a total gas content of less than 850 ppm, a carbon content of less than 100 ppm and low particulates upon sputtering.