The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 06, 1989

Filed:

May. 01, 1987
Applicant:
Inventors:

Ju-Chui Lin, Strongsville, OH (US);

Kirk J Abbey, Seville, OH (US);

Assignee:

The Glidden Company, Cleveland, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F / ; C08F / ;
U.S. Cl.
CPC ...
546 12 ; 548402 ;
Abstract

New Cobalt (II) nitrilomethylidyne dipyrrole complexes such as Cobalt (II) 2,2'-[trimethylenebis(nitrilomethylidyne)]-dipyrrole, Cobalt(II) 2,2'[o-phenylenebis(nitrilomethylidyne)]-dipyrrole and their basic ligand complexes are effective catalysts for molecular weight control in acrylate/methacrylate polymerization. The Cobalt (II) complex of a nitrilomethylidyne dipyrrole comprises the structure: ##STR1## where R is a diradical selected form trimethylene bis-, o-phenylenebis, or ethylenebis. The process comprises polymerizing monomers, especially including methacrylic monomer or methacrylic/acrylic monomer, in the presence of azo initiator and between 0.0001% and 0.01% of Cobalt (II) 2,2'-[trimethylenebis (nitrilomethylidyne)]-dipyrrole and/or Cobalt (II) 2,2'-[-phenylenebis (nitrilomethylidyne]-dipyrrole complexes to produce low molecular weight acrylate polymers and copolymers.


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