The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 1989
Filed:
Jul. 25, 1983
Applicant:
Inventors:
Jean-Luc Lepage, Lyon, FR;
Gerard Simon, Villeurbanne, FR;
Assignee:
Rhone-Poulenc Specialites Chimiques, Courbevoie, FR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01B / ;
U.S. Cl.
CPC ...
423342 ; 423341 ; 423347 ; 423D / ; 204164 ;
Abstract
Trichlorosilane, SiHCl.sub.3, is facilely prepared by (i) thermally reducing silicon tetrachloride, SiCl.sub.4, with hydrogen to produce reaction admixture comprising SiHCl.sub.3 and hydrochloric acid, said thermal reduction being carried out in a thermal plasma while tempering the reaction medium with a cooling gas, (ii) reacting said step (i) reaction admixture with elemental silicon at a temperature of from about 250.degree. to 350.degree. C. to produce SiHCl.sub.3 and hydrogen therefrom, and thence (iii) separating (iiia) the plasma-creating, hydrogen and cooling gases, and (iiib) product silicon chlorides therefrom.