The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 06, 1989

Filed:

Nov. 13, 1987
Applicant:
Inventors:

Hisao Oishi, Kanagawa, JP;

Kazuhiko Yanagihara, Kanagawa, JP;

Tadashi Miyakawa, Kanagawa, JP;

Takeshi Nakamura, Osaka, JP;

Kazuhiko Akimoto, Osaka, JP;

Mitsuaki Shioji, Osaka, JP;

Assignees:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02F / ; G02B / ;
U.S. Cl.
CPC ...
350334 ; 3503 / ; 350342 ; 350114 ;
Abstract

A liquid crystal shutter array requiring no separate focusing lens system. Microlenses for focusing the light incident upon a matrix of pixel electrodes are formed in a transparent substrate of the shutter assembly. A refractive index of light of each of the microlenses is set in a manner such that the incident angle .theta. of the light incident on the liquid crystal of the shutter through the microlenses satisfies; ##EQU1## where P, a, and d respectively represent the size of each of the photomasks, the length of a portion wherein each of the photomasks and corresponding ones of the pixel electrodes overlap, and the thickness of the transparent substrate on the light output side.


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