The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 1989
Filed:
Dec. 23, 1987
Applicant:
Inventor:
Keerthi Devendra, Bristol, GB;
Assignee:
Rolls-Royce plc, London, GB;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B22D / ;
U.S. Cl.
CPC ...
164132 ; 164369 ; 156628 ; 156655 ; 156664 ; 156667 ;
Abstract
This invention relates to a method of enhancing the leaching rate of a given material. The material is provided with a plurality of pores 16 each of which contain a gas, such as for example air, which is intermittantly exposed to the leaching solution 20 by the action of said leaching solution and acts to promote the rapid removal of the reaction product away from the core/leading solution interface 22.
Devendra, Keerthi. (1989). Method of enhancing the leaching rate of a given material (U.S. Patent No. 4836268). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4836268
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