The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 1989
Filed:
Jul. 01, 1987
Applicant:
Inventors:
Richard E Demaray, Hercules, CA (US);
Gary B Crumley, Oakland, CA (US);
Assignee:
The BOC Group, Inc., Montvale, NJ (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
204298 ; 20412912 ;
Abstract
A magnetron sputter coating device having a target of material to be sputtered and a magnetic means for producing a closed-loop magnetic tunnel capable of confining a glow discharge adjacent a surface of the target is disclosed. A groove is provided in the surface of the target along at least part of the erosion region. The groove affects the sputtering voltage and profile of the sputtering surfaces as it erodes. The dimensions and locations of the groove can be selected to optimize the effects for particular magnetron sputtering devices.