The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 1989
Filed:
Apr. 19, 1988
Albert V Crewe, Palos Park, IL (US);
Orchid One, Palos Hills, IL (US);
Abstract
An encapsulated high brightness source for use in or with an electron beam system such as an electron beam microscope. The source preferably includes a field emitter. The source includes source enclosure means which defines an ultra high vacuum enclosure for the field emitter. A lens which serves as part of the ultra high vacuum enclosure for the source defines a differential pressure aperture. Other lens elements draw electrons from the field emitter and form a focus on axis in the vicinity of the differential pressure aperture, which serves as an effective point source for the associated electron beam system. The source may be permanently built-in or modular; if modular, it may be assembled, tested, and stored in an ultra high vacuum operative condition for OEM assembly or as a replacement part.