The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 23, 1989
Filed:
Dec. 30, 1985
Applicant:
Inventor:
Michael Nagler, Reseda, CA (US);
Assignee:
T. R. Whitney Corporation, Reseda, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B / ;
U.S. Cl.
CPC ...
350-68 ; 350446 ;
Abstract
A light beam focusing system provides a diffraction limited spot across a wide flat field format by using a scanning surface arranged with a system of spherical mirrors to achieve dynamic field flattening. The scanning surface is pivoted about an axis of rotation to image the beam along a noncircular image line, and the spherical mirror system provides magnification of the image in a sense and amplitude to provide a substantially uniform focused scanning spot throughout the flat object field. The system compensates for higher order spherical aberrrations, is fully achromatic and can be used with high power beams.