The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 16, 1989
Filed:
Jun. 19, 1987
Applicant:
Inventor:
W Derek Buckley, Easton, CT (US);
Assignee:
The Perkin-Elmer Corporation, Norwalk, CT (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K / ;
U.S. Cl.
CPC ...
378 34 ; 378156 ; 378159 ; 2505031 ;
Abstract
This invention is directed to an improvement in an x-ray lithography system having an x-ray point source of radiation, a wafer disposed in spaced relationship with respect to the source, and a mask disposed between the source and the wafer whereby radiation from the source passes through the mask to the wafer, said improvement comprising the provision of an x-ray absorbent element mounted between the source and the wafer, said element having a radial absorption gradient profile to compensate for radial flux variation of the x-rays.