The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 16, 1989

Filed:

Jul. 02, 1987
Applicant:
Inventors:

Bawa Singh, Cherry Hill, NJ (US);

Yehuda Arie, East Windsor, NJ (US);

Ormond R Mesker, Lambertville, NJ (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
156613 ; 156614 ; 156D / ; 427 39 ; 427 42 ; 118723 ; 423446 ;
Abstract

The present invention includes an apparatus and method for depositing diamond on a substrate. A hydrocarbon/hydrogen gas mixture is passed through a refractory metal hollow cathode which is self heated to a high temperature. The gas mixture is dissociated by a combination of thermal and plasma effects. The plasma plume emanating from the hollow cathode heats the substrate which is positioned on a surface of the anode. Growth of the diamond film is enhanced by bombardment of electrons.


Find Patent Forward Citations

Singh, Bawa. (1989). Hollow cathode plasma assisted apparatus and method of diamond synthesis (U.S. Patent No. 4830702). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4830702

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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