The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 16, 1989

Filed:

Jul. 19, 1988
Applicant:
Inventors:

Alfred Pichler, Maisach, DE;

Joachim Hertrampf, Munich, DE;

Horst Pachonik, Taufkirchen, DE;

Assignee:

Siemens Aktiengesellschaft, Berlin and Munich, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B / ;
U.S. Cl.
CPC ...
29603 ; 360123 ;
Abstract

Method for manufacturing terminal contacts for thin-film magnetic heads. A photolithographic process sequence is desirable when manufacturing coherent terminal contacts for thin-film magnetic heads that allows the technological complexity to be kept as low as possible taking metrological and mechanical points of view into consideration. To that end, an electrically conductive permalloy layer, buried under a protective aluminum oxide layer, is structured with a metallic mask such that interconnects that temporarily short the magnetic heads having two write/read heads on a substrate element during the photolithographic process execution are brought together at a location which is later parted along a parting line. As a result of the short, the application of an additional, metallic carrier layer as a galvanic underlayment for a gold film is avoided.


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