The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 09, 1989

Filed:

Nov. 21, 1986
Applicant:
Inventors:

Toshitaka Takei, Suita, JP;

Tsunemasa Funatsu, Sakai, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05C / ;
U.S. Cl.
CPC ...
118 64 ; 118 52 ; 118320 ; 118326 ; 118667 ; 427422 ; 165156 ; 165169 ; 165 30 ; 165 64 ; 134105 ; 134200 ;
Abstract

A resist developing apparatus comprising a developing tank consisting of a top portion, a body portion, and a bottom portion, at least one of the top, body, and bottom portions being comprised of an inner wall and an outer wall, a heat exchange chamber being defined between the inner and outer walls for being supplied with a heating medium; a chuck disposed inside the developing tank for holding a work piece in position, a nozzle for spraying chemical liquid toward the work piece held in position by the chuck; a heating medium supply unit for supplying heating medium at a specified temperature to the heat exchange chamber; and piping connecting between the heating medium supply unit and the heat exchange chamber, whereby the interior of the developing tank is adapted to be controlled to a specified temperature.


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