The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 02, 1989

Filed:

Nov. 02, 1987
Applicant:
Inventors:

Leonard F Altman, Coral Springs, FL (US);

Kevin D Moore, Schaumburg, IL (US);

John D Shurboff, Palm City, FL (US);

Assignee:

Motorola, Inc., Schaumberg, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; B44C / ; B29C / ;
U.S. Cl.
CPC ...
357 67 ; 156644 ; 156652 ; 156655 ; 1566591 ; 156668 ; 357 71 ; 430313 ; 430317 ; 437203 ; 437235 ;
Abstract

This process uses a metal lift-off step and results in a layer of polyimide covering the surface of an integrated circuit, except at the bonding pads which are covered by metals. A layer of polyimide is applied to the surface of an integrated circuit and then partially cured. A layer of positive photo-resist is applied over the polyimide layer and then pattern exposed and developed, resulting in windows being opened up over the bonding pads of the integrated circuit. The remaining photo-resist is then flood exposed. One or more metals are then sputtered over the resist and the bonding pads. The integrated circuit is then immersed in solvent and the remaining layer of photo-resist, including the metal above it, is lifted-off. Only the metal over the bonding pads remains. The polyimide layer is then fully cured.


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