The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 1989
Filed:
Oct. 26, 1987
Applicant:
Inventors:
Ronny W Lin, Baton Rouge, LA (US);
Venkataraman Ramachandran, Baton Rouge, LA (US);
Assignee:
Ethyl Corporation, Richmond, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C / ; C07C / ;
U.S. Cl.
CPC ...
558423 ; 558376 ; 558425 ; 560100 ;
Abstract
In a process for preparing a (trifluoromethyl)napthalene by reacting a halonapthalene with a trifluoroacetate in the presence of cuprous iodide and a dipolar aprotic solvent and separating out the inorganic ingredients of the final reaction mixture in the recovery of the product, the cuprous iodide is recovered by washing the separated inorganic ingredients with an alcohol and a carboxylic acid and then with water to purify the cuprous iodide.