The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 1989
Filed:
Jan. 11, 1988
Applicant:
Inventors:
Dilip K Chatterjee, Rochester, NY (US);
Srinivas T Rao, Los Gatos, CA (US);
Assignee:
Eaastman Kodak Company, Rochester, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B22F / ;
U.S. Cl.
CPC ...
75246 ; 204292 ; 419 23 ; 419 31 ; 419 33 ; 419 48 ; 419 57 ; 419 60 ;
Abstract
Sputtering targets are made by melting at least one rare earth and at least one transition metal to produce an amorphous alloy melt, forming a powder of the alloy in an oxygen free atmosphere, introducing the powdered alloy into a reducing mold, adding a layer of powdered oxygen-getter on top of the powdered alloy, and hot pressing the alloy.
Chatterjee, Dilip. (1989). Sputtering targets for magneto-optic films and a method for making (U.S. Patent No. 4824481). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4824481
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile