The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 1989
Filed:
Oct. 26, 1987
Applicant:
Inventor:
Hiroshi Nomura, Minnetonka, MN (US);
Assignee:
Applied Membrane Technology, Inc., Minnetonka, MN (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01D / ;
U.S. Cl.
CPC ...
55 16 ; 55 68 ; 55158 ; 427 41 ; 428391 ;
Abstract
Gas permselective membranes having a high selectivity and high flux are prepared by plasma polymerizing a coating onto the surface of a microporous membrane substrate. Two types of coatings are disclosed. Gas separatory modules utilize the novel membranes in the form of hollow fibers.
Nomura, Hiroshi. (1989). Gas permselective composite membrane prepared by plasma polymerization (U.S. Patent No. 4824444). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4824444
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile