The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 1989
Filed:
Jul. 02, 1987
Masao Kosugi, Yokohama, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An alignment and exposure apparatus for aligning and exposing, in sequence, different shot areas of a semiconductor wafer with and to a pattern formed on a reticle is disclosed. The apparatus includes an alignment system having at least one objective optical system for detecting, at the same time, alignment marks provided in association with neighboring shot areas of the wafer which are to be exposed to the reticle pattern in sequence. Thus, with a simple structure and without the necessity of excessive movement of the wafer, signals providing sufficient positional information necessary for aligning each shot area with the reticle pattern are obtainable. This assures improved throughput and improved alignment accuracy.