The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 1989
Filed:
Apr. 23, 1986
S Roy Morrison, Burnaby, CA;
Robert F Frindt, Vancouver, CA;
Per Joensen, Coquitlam, CA;
Michael A Gee, Vancouver, CA;
Bijan K Miremadi, Coquitlam, CA;
Simon Fraser University, Burnaby, CA;
Abstract
Novel single layer materials of the form MX.sub.2, where MX.sub.2 is a layer-type dichalcogenide such as MoS.sub.2, TaS.sub.2, WS.sub.2, or the like, exfoliated by intercalation of an alkali metal, and immersion in water, are disclosed. MoS.sub.2 has been exfoliated into monolayers by intercalation with lithium followed by reaction with water. X-ray diffraction analysis demonstrates that the exfoliated MoS.sub.2 in suspension is in the form of one-molecule-thick sheets. X-ray patterns from dried and re-stacked films of exfoliated MoS.sub.2 indicate that the layers are randomly stacked. By adsorbing monolayers or precipitating clusters of various species such as compounds of Co, Ni, Pb, Cd, Al, Ce, In and Zn, on MoS.sub.2 while the sulfide is suspended as single layers and then recrystallizing, a new group of inclusion compounds can be formed. In the re-crystallized or re-stacked materials, the inter-layer spacing can be expanded or contracted compared to MoS.sub.2.