The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 1989
Filed:
Feb. 28, 1986
Franklin H Cocks, Durham, NC (US);
Roland Gettliffe, Durham, NC (US);
Duke University, Durham, NC (US);
Abstract
X-rays can be physically reflected from surfaces under certain conditions and quantitative measurements of the reflected X-ray intensity around the critical angle for X-ray reflection may be utilized to provide a method for the chemical analysis of very thin surface layers or thin films including adsorbed organic films. This method of chemical analysis is based on different physical principles than the well-known X-ray diffraction or fluorescence methods. The X-ray reflection method for the chemical analysis of thin surface layers depends on the influence of the X-ray absorptivity of the surface layers upon the concommitant angular or wavelength dependence of the intensity of the reflected X-ray. Because the reflected wave does not significantly penetrate the sample, the sample depth for chemical analysis by the reflected X-ray beam can be very thin, for example about 100 angstroms in thickness.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile