The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 1989
Filed:
Sep. 18, 1987
Masafumi Nakaishi, Inagi, JP;
Masao Yamada, Yokohama, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
A membrane of the present invention used for a mask for X-ray exposure is made of an amorphous of boron nitride carbide hydrogenated, containing 1 to 10 atomic percent of carbon. This membrane is made in a plasma CVD, whose source gases are ammonia, diborane and methane diluted in argon gas. The flow rate ratio of the ammonia to the diborane is 0.6 to 1.55, the deposition temperature is 350.degree. to 500.degree. C., the gas pressure is 60 to 250 Pa, the applied RF power is 0.1 to 0.17 W/cm.sup.2. Thus formed membrane is adequately transparent to a visible light and the X-ray used for mask alignment, while keeping the stiffness enough and the residual stress properly tensile.