The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 1989

Filed:

Jan. 15, 1988
Applicant:
Inventors:

Mei-jan L Lin, Naperville, IL (US);

Richard J Mouche, Batavia, IL (US);

Baker N Nimry, Downers Grove, IL (US);

Dodd W Fong, Naperville, IL (US);

Assignee:

Nalco Chemical Company, Naperville, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B / ; B01D / ;
U.S. Cl.
CPC ...
423242 ; 423243 ; 210700 ; 210701 ;
Abstract

Gypsum scale inhibitors useful under wet flue gas desulfurization (FGD) scrubber temperature and pH conditions. The gypsum inhibitors advantageously prevent or minimize gypsum scale formation and crystal growth in mist eliminator wash water and in the scrubber internals. Specific inhibitors contemplated include copolymers of modified acrylic acid/acrylamide; acrylic acid/vinyl acetate; acrylic acid/maleic anhydride; acrylic acid/acrylate ester; and combinations thereof. In addition, gypsum scale inhibitors comprising phosphonate-polymer blends of hexamethylene diamine tetra (methylene phosphonic acid) salts and polymaleate, poly(acrylic acid/ethylacrylate), poly(acrylic acid/N-methoxypropyl acrylamide/acrylamide), poly(acrylic acid/N-propyl acrylamide/acrylamide), and combinations thereof are also contemplated.


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