The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 04, 1989

Filed:

Nov. 12, 1987
Applicant:
Inventors:

Peter Hubert, Alzenau, DE;

Barbara Kussel, Rodgau, DE;

Peter Wirz, Waldernbach, DE;

Assignee:

Leybold-Heraeus GmbH, Colonge, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
204298 ; 20419212 ;
Abstract

In a cathode sputtering apparatus, in order to achieve a very uniform utilization of the target and a high-quality coating on the substrate, the cathode is provided on its side of the target facing away from the substrate with a flat plate on which a plurality of magnets are disposed in rows, the magnets of the individual rows parallel to one another being at approximately equal distances apart and having the same polarity. Moreover, the magnetic of the one row are offset by a dimension g from the magnets of the adjacent row, so that, in the area of the target provided with the coating material, when the cathode is used in a chamber with suitable gas pressure and with a voltage of any desired frequency is applied, plasma tubes form which are like serpentinely curved racetracks.


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